Conference Agenda
Overview and details of the sessions of this conference. Please select a date or location to show only sessions at that day or location. Please select a single session for detailed view (with abstracts and downloads if available).
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Session Overview |
| Date: Wednesday, 18/June/2025 | |
| 9:00am - 10:45am |
SESSION 4: UWBG MATERIALS Chair: Michał Boćkowski Type of Contribution: Oral Homoepitaxial growth of β-Ga2O3 by MOVPE LEIBNIZ-INSTITUT FÜR KRISTALLZÜCHTUNG im Forschungsverbund Berlin e.V., Germany 9:30am - 9:45am Type of Contribution: Oral Study of optical anisotropy and polarization effects in β-Ga2O3 by X-ray excited optical luminescence 1: Departamento de Física de Materiales, Universidad Complutense de Madrid, Spain; 2: European Synchrotron Radiation Facility, ESRF, Grenoble, France; 3: 2D Foundry Group. Instituto de Ciencia de Materiales de Madrid, Spain; 4: Institute of Materials Research, Washington State University, USA 9:45am - 10:00am Type of Contribution: Oral AlScN barrier HEMTs grown by NH3-MBE with AlN and GaN cap layers Université Côte d'Azur, France 10:00am - 10:15am Type of Contribution: Oral Diamond/AlN/diamond heterostructure 1: University of Cádiz, Spain; 2: Hasselt University, Belgium; 3: University of Glasgow, Glasgow, United Kingdom 10:15am - 10:30am Type of Contribution: Oral Inter-die Hybrid Cu/Diamond Microbump Bonding for 3D Heterogeneous Integration 1: Birck Nanotechnology Center and School of Mechanical Engineering, Purdue University, USA; 2: Instituto de Telecomunicações, University of Aveiro, Portugal; 3: CICECO – Aveiro Institute of Materials, Department of Materials and Ceramic Engineering, University of Aveiro, Portugal |
| 10:45am - 11:15am |
COFFEE BREAK |
| 11:15am - 12:45pm |
SESSION 5: UWBG DEVICES Chair: Konstantinos Zekentes Type of Contribution: Oral Assessment of diamond substrates by time of flight electron beam induced current Univ. Grenoble Alpes, France 11:45am - 12:00pm Type of Contribution: Oral Is CVD diamond (soon?) ready to become an electronic material? Seki Diamond Systems, Cornes Technologies USA, USA 12:00pm - 12:15pm Type of Contribution: Oral Influence of Growth Temperature and Scandium Concentration on the Surface Oxidation of ScAlN Films Grown by Molecular Beam Epitaxy 1: Université Côte d’Azur, CNRS, CRHEA, rue B. Gregory, 06560 Valbonne, France; 2: Mines Paris, PSL University, Center for Material Forming (CEMEF), UMR CNRS, 06904 Sophia Antipolis, France; 3: University Lille, CNRS, Centrale Lille, Junia, University Polytechnique Hauts de France, UMR 8520-IEMN, F59000 Lille, France 12:15pm - 12:30pm Type of Contribution: Oral On the rapid thermal annealing of AlN thin films for piezoelectric MEMS 1: Microelectronics Lab (meLAB), James Watt School of Engineering, University of Glasgow, UK; 2: Department of Material Sciences, Metallurgical Engineering and Inorganic Chemistry, University of Cádiz, Spain; 3: Institute of Thin Films, Sensors and Imaging, University of the West of Scotland, UK 12:30pm - 12:45pm Type of Contribution: Oral AlGaN growth for FinFET devices 1: Institute of High Pressure Physics, PAS, Poland; 2: Center for III-Nitride Technology, C3NiT-Janzén, Solid State Physics and NanoLund, Lund University, Sweden; 3: Volvo Cars Corporation, Greater Gothenburg Metropolitan Area, Sweden; 4: Department of Electrical and Information Technology and NanoLund, Lund University, Sweden; 5: Hexagem AB, Sweden; 6: Center for III-Nitride Technology, C3NiT-Janzén, Department of Physics, Chemistry and Biology (IFM), Linköping University, Sweden |
| 12:45pm - 3:00pm |
LUNCH |
| 3:00pm - 4:45pm |
SESSION 6: OTHER SEMICONDUCTOR-BASED APPLICATIONS Chair: Maria Rosário P. Correia Type of Contribution: Oral Bandgap-Engineered III-V-N Superlattices for Monolithic Tandem Solar Cells Lattice-Matched to Si Instituto de Sistemas Optoelectrónicos y Microtecnología, Spain 3:15pm - 3:30pm Type of Contribution: Oral 13mW/µm² and 24% PAE at 94GHz for 0.44-um Transferred InP/GaAsSb DHBT on Si 1: IEMN, France; 2: STMicroelectronics, Crolles, 38920, France 3:30pm - 3:45pm Type of Contribution: Oral Vacancies in NiO: DFT Study for Optoelectronic Applications Universidad Complutense de Madrid, Spain 3:45pm - 4:00pm Type of Contribution: Oral Simulation and Analysis of MOVPE Grown III-V PIN Diodes for RF Applications Universidad Politécnica de Madrid, Spain 4:00pm - 4:15pm Type of Contribution: Indifferent Fabrication and monitoring of quantum emitters in Aluminium Nitride via Al-ion implantation and thermal annealing 1: Dipartimento di Fisica, Università di Torino, via Pietro Giuria 1, Torino 10125, Italy; 2: Istituto Nazionale di Fisica Nucleare (INFN), Sezione di Torino, via Pietro Giuria 1, Torino 10125 Italy; 3: School of Engineering, Cardiff University, Queen’s Building, The Parade, Cardiff CF24 3AA, United Kingdom; 4: Translational Research Hub, Cardiff University, Maindy Road, Cathays, Cardiff CF24 4HQ, United Kingdom 4:15pm - 4:30pm Type of Contribution: Oral Novel Ion Detection Strategy for Deterministic Implantation Using an Ultra-Thin Silicon Carbide Membrane Detector 1: National Research Council of Italy - Institute for Microelectronics and Microsystems, Italy; 2: Division of Experimental Physics, Ruđer Bošković Institute; 3: Department of Physics and Astronomy “Ettore Majorana”, University of Catania |
| 4:45pm - 6:00pm |
PS-2: POSTER SESSION Chair: Juan Luis Garcia-Pomar Type of Contribution: Indifferent Co-Integration of High-Frequency Devices on Epitaxial ScAlN for Tunable RF SAW Filters 1: Univ. Lille, CNRS, Centrale Lille, Univ. Polytechnique Hauts-de-France, UMR 8520 – IEMN-Institut d’Electronique de Microélectronique et de Nanotechnologie, F-59000, Lille, France; 2: Université Côte d’Azur, CNRS, CRHEA, rue B. Gregory, 06560 Valbonne, France; 3: Université de Lorraine - CNRS, Institut Jean Lamour UMR 7198, Nancy,54000, France Type of Contribution: Oral Study of RF-sputtered Ga₂O₃ Thin Films for DUV Photodetectors 1: Instituto Superior Técnico, University of Lisbon, Portugal; 2: INESC Microsystems and Nanotechnology, Lisbon, Portugal; 3: IPFN, Instituto Superior Técnico, University of Lisbon, Portugal; 4: Departamento de Física and BioISI – BioSystems and Integrative Sciences Institute, Faculdade de Ciências, University of Lisbon, Portugal; 5: Centro de Química Estrutural, Institute of Molecular Sciences and Departamento de Engenharia Química, Instituto Superior Técnico, University of Lisbon, Portugal; 6: CeFEMA, Instituto Superior Técnico, University of Lisbon, Portugal Type of Contribution: Poster Formation and modification of Ag and Au nanoparticles created by ion implantation in Ga2O3 thin films 1: Instituto Superior Técnico, University of Lisbon and INESC MN, Portugal; 2: INESC MN, Lisbon, Portugal; 3: IPFN, Instituto Superior Técnico, University of Lisbon, Portugal; 4: C2TN, Instituto Superior Técnico, University of Lisbon, Portugal; 5: DECN, Instituto Superior Técnico, University of Lisbon, Portugal; 6: Division of Experimental Physics, Ruđer Bošković Institute, Bijenička cesta 54, Zagreb, Croatia Type of Contribution: Poster Swift Heavy Ion irradiation of GaN and AlGaN Semiconductors 1: INESC MN, Lisboa, 1000-029 Portugal; 2: Instituto Superior Técnico, University of Lisbon, Lisboa, Portugal; 3: IPFN, Instituto Superior Técnico, University of Lisbon , Campus Tecnológico e Nuclear, Lisboa, Portugal; 4: Institute of Ion Beam Physics and Materials Research, Helmholtz-Zentrum Dresden-Rossendorf, Germany; 5: CIMAP (CEA, CNRS, ENSICAEN, UCN), Caen, France Type of Contribution: Oral Proton beam imaging using GaN detector array 1: Université Côte d’Azur, CNRS-CRHEA; 2: Institut Méditerranéen de ProtonThérapie – Centre Antoine Lacassagne; 3: Lehrstuhl für Angewandte Festkörperphysik, Ruhr-Universität Bochum; 4: IPHC-CNRS Type of Contribution: Poster Multiscale characterization of silicon carbide (4H-SiC) after sulfurization treatments 1: Consiglio Nazionale delle Ricerche – Istituto per la Microelettronica e Microsistemi (CNR-IMM), Z.I. VIII Strada 5, 95121 Catania, Italy; 2: HUN-REN Centre for Energy Research, Institute of Technical Physics and Materials Science, Konkoly-Thege ut 29-33, 1121 Budapest, Hungary Type of Contribution: Poster Scalable growth of optically uniform MoWS2 alloys by sulfurization of ultrathin Mo/W films 1: Consiglio Nazionale delle Ricerche – Istituto per la Microelettronica e Microsistemi (CNR-IMM), Z.I. VIII Strada 5, 95121 Catania, Italy; 2: HUN-REN Centre for Energy Research, Institute of Technical Physics and Materials Science, Konkoly-Thege ut 29-33, 1121 Budapest, Hungary; 3: Department of Photonics Izmir Institute of Technology, 35430 Izmir, Turkiye Type of Contribution: Oral Ohmic contacts on phosphorus-doped diamond fabricated by FIB transformation and surface Ga+ implantation 1: Department of Applied Physics, University of Cádiz, 11510 Puerto Real, Spain; 2: IMEYMAT, University of Cádiz, 11510 Puerto Real, Spain; 3: Department of Material Science, University of Cádiz, 11510 Puerto Real, Spain; 4: Orbray Co., Ltd., 3-8-22 Shinden, Adachi-ku, Tokyo, 123-8511 Japan. Type of Contribution: Poster Structural study of ZnOthin films obtained by plasma assisted magnetron sputtering 1: Dpto. Ciencia de los Materiales e IM y QI, Universidad de Cádiz, 11510-Puerto Real,Spain; 2: MicroelectronicsLab, James Watt SchoolofEngineering, Universityof Glasgow, G12 8QQ Glasgow, UK; 3: IMEYMAT, UCA, Spain; 4: Dpto. Física Aplicada, Universidad de Cádiz, 11510-Puerto Real, Spain Type of Contribution: Poster Graphene Powder Synthesized via Microwave Plasma at Atmospheric Pressure as a Multifunctional Material for Compound Semiconductor Applications Laboratory of Innovation in Plasmas, Universidad de Córdoba, Spain |
| 7:30pm - 10:00pm |
SOCIAL EVENT-2: FLAMENCO & TAPAS |

