Conference Agenda

Overview and details of the sessions of this conference. Please select a date or location to show only sessions at that day or location. Please select a single session for detailed view (with abstracts and downloads if available).

Please note that all times are shown in the time zone of the conference. The current conference time is: 15th May 2024, 10:23:18am BST

 
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Session Overview
Location: ESCL A09
Engineering & Science Learning Centre (ESLC) University Park, Building 54 Nottingham
Date: Monday, 04/Sept/2023
2:05pm
-
3:25pm
Session 2-3: Inorganic / Depth Profiling 1
Location: ESCL A09
 
2:05pm - 2:25pm

Zirconia nanotubes as a potential tool for controlled drug release in implant systems

Gabriel Onyenso, Manuela Killian

Universität Siegen, Germany



2:25pm - 2:45pm

Oxygen detection limit improvement for dynamic SIMS and TOF-SIMS

Alexandre Merkulov, Alexis Franquert

IMEC, Belgium



2:45pm - 3:05pm

ToF-SIMS analyses in an H2 atmosphere: Improvements in depth profiling and reduction of matrix effect

Jernej Ekar1,2, Janez Kovač1

1: Jožef Stefan Institute, 1000 Ljubljana, Slovenia; 2: Jožef Stefan International Postgraduate School, 1000 Ljubljana, Slovenia



3:05pm - 3:25pm

Multi-energy proton implantation in silicon: challenges in dynamic-SIMS hydrogen depth profiling

Orazio Samperi1, Lasse Vines2, Mario Pietro Bertolini3, Massimiliano Cantiano3, Salvatore Coffa3, Maria Elena Fragalà1

1: University of Catania, Italy; 2: University of Oslo, Norway; 3: STMicroelectronics Catania, Italy

4:00pm
-
5:20pm
Session 3-3: Inorganic / Depth Profiling 2
Location: ESCL A09
 
4:00pm - 4:20pm

Alkali Ion Transport in Lithium Borate Glass: New Insights into the Site Energy Distribution from CAIT/ToF-SIMS experiments and theory

Karl-Michael Weitzel1, Victor Gunawan1, Marco Bosi2, Martin Schäfer1, Philipp Maass2

1: Philipps-Universität Marburg, Germany; 2: Universität Osnabrück, Germany



4:20pm - 4:40pm

Structurally ‘smart’ implants: Imparting micro-nanoscale coatings to bulk-ceramics

Swathi Naidu Vakamulla Rgahu1, Patrick Hartwich1, Adam Patalas2, Manuela Sonja Killian1

1: University of Siegen, Germany; 2: Poznan University of Technology, Poznan, Poland



4:40pm - 5:00pm

OrbiSIMS characterisation: Low energy depth profiling of semiconductor materials - depth resolution and sensitivity

Yundong Zhou1, Alexis Franquet2, Valentina Spampinato2,3, Gustavo F. Trindade1, Alex Merkulov2, Paul van der Heide2, Wilfried Vandervorst2, Ian Gilmore1

1: National Physical Laboratory, Hampton Rd, Teddington TW11 0LW, UK; 2: IMEC, Kapeldreef 75, 3001 Leuven, Belgium; 3: Università degli Studi di Catania, Dipartimento di Scienze Chimiche, Viale A. Doria 6, 95125 Catania, Italy



5:00pm - 5:20pm

Investigation of atomic-scale decorations on mixed conductive materials by Time-of-flight secondary ion mass spectrometry (ToF-SIMS)

Florian Fahrnberger1, Siebenhofer Matthäus1,2, Herbert Hutter1, Markus Kubicek1

1: Institute of Chemical Technologies and Analytics, TU Wien, Austria; 2: CEST Centre of Electrochemistry and Surface Technology, Wr. Neustadt, Austria


 
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